A New Perfluoropolyether-Based Hydrophobic and Chemically Resistant Photoresist Structured by Two-Photon Polymerization

Carmela De Marco; Arune Gaidukeviciute; Roman Kiyan; Shane M. Eaton; Marinella Levi; Roberto Osellame; Boris N. Chichkov; Stefano Turri

doi:10.1021/la303799u

A New Perfluoropolyether-Based Hydrophobic and Chemically Resistant Photoresist Structured by Two-Photon Polymerization

Carmela De Marco^*
, Arune Gaidukeviciute
, Roman Kiyan
, Shane M. Eaton
, Marinella Levi
, Roberto Osellame
, Boris N. Chichkov
, Stefano Turri

^*Korrespondierende*r Autor*in für diese Arbeit

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review

Abstract

Two-photon polymerization technology has been used to fabricate submicrometer three-dimensional (3D) structures using a new polyfunctional perfluoropolyether-based resist, which is a polymer intrinsically hydrophobic and chemically resistant. The fluorinated resist was designed and synthesized in this work and successfully employed to fabricate woodpile structures in various experimental conditions. This is the first demonstration of the capability to fabricate hydrophobic and chemically resistant 3D structures with submicrometer resolution and arbitrary geometry.

Originalsprache	Englisch
Seiten (von - bis)	426-431
Seitenumfang	6
Fachzeitschrift	LANGMUIR
Jahrgang	29
Ausgabenummer	1
DOIs	https://doi.org/10.1021/la303799u
Publikationsstatus	Veröffentlicht - 3 Dez. 2012
Extern publiziert	Ja

ASJC Scopus Sachgebiete

Allgemeine Materialwissenschaften
Physik der kondensierten Materie
Oberflächen und Grenzflächen
Spektroskopie
Elektrochemie

Zugriff auf Dokument

10.1021/la303799u

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AU - Eaton, Shane M.

AU - Levi, Marinella

AU - Osellame, Roberto

AU - Chichkov, Boris N.

AU - Turri, Stefano

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