@inproceedings{312e66616c624c788cebd8f40c36dc74,
title = "Atom lithography with cold metastable Ne* atoms",
abstract = "Experimental results as well as numerical simulation of atom lithography with a laser cooled metastable Ne* beam are discussed. Simulation results clearly show the feasibility for sub-10 nm structures by atom lithography.",
author = "P. Engels and W. Ertmer and K. Sengstock",
year = "2000",
month = aug,
day = "6",
language = "English",
isbn = "1-55752-608-7",
series = "OSA trends in optics and photonics : TOPS",
publisher = "IEEE Computer Society",
booktitle = "Quantum Electronics and Laser Science Conference (QELS 2000)",
address = "United States",
note = "Quantum Electronics and Laser Science Conference (QELS 2000), QELS 2000 ; Conference date: 07-05-2000 Through 12-05-2000",
}