Fourier Scatterometry for Characterization of Sub-wavelength Periodic Two Photon Polymerization Structures

K. Frenner; V. Ferreras Paz; S. Peterhänsel; W. Osten; A. Ovsianikov; K. Obata; B. Chichkov

doi:10.1063/1.3657911

Fourier Scatterometry for Characterization of Sub-wavelength Periodic Two Photon Polymerization Structures

K. Frenner^*
, V. Ferreras Paz
, S. Peterhänsel
, W. Osten
, A. Ovsianikov
, K. Obata
, B. Chichkov

^*Korrespondierende*r Autor*in für diese Arbeit

Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review

Abstract

In the present paper we extend Fourier-Scatterometry by the use of the coherent properties of white light for the characterization of sub-wavelength periodic gratings of photosensitive material structured by two-photon polymerization. Our goal is a fast and precise optical characterization of periodical gratings of sub 100 nm size. The investigated structures include gratings produced by two-photon polymerization of photosensitive material and typical semiconductor test gratings. A Fourier-Scatterometer has been set up using a white light source and also additionally a reference-branch for white-light-interference (WLI). A sensitivity comparison between Fourier-Scatterometry and WLI-Scatterometry is presented.

Originalsprache	Englisch
Titel des Sammelwerks	Frontiers of Characterization and Metrology for Nanoelectronics
Untertitel	´
Seiten	324-329
Seitenumfang	6
DOIs	https://doi.org/10.1063/1.3657911
Publikationsstatus	Veröffentlicht - 14 Nov. 2011
Extern publiziert	Ja
Veranstaltung	Frontiers of Characterization and Metrology for Nanoelectronics: 2011 - Grenoble, Frankreich Dauer: 23 Mai 2011 → 26 Mai 2011

Publikationsreihe

Name	AIP Conference Proceedings
Band	1395
ISSN (Print)	0094-243X
ISSN (elektronisch)	1551-7616

Konferenz

Konferenz	Frontiers of Characterization and Metrology for Nanoelectronics: 2011
Land/Gebiet	Frankreich
Ort	Grenoble
Zeitraum	23 Mai 2011 → 26 Mai 2011

ASJC Scopus Sachgebiete

Allgemeine Physik und Astronomie

Zugriff auf Dokument

10.1063/1.3657911

Andere Dateien und Links

Link zur Publikation in Scopus

Dieses zitieren

Frenner, K., Paz, V. F., Peterhänsel, S., Osten, W., Ovsianikov, A., Obata, K., & Chichkov, B. (2011). Fourier Scatterometry for Characterization of Sub-wavelength Periodic Two Photon Polymerization Structures. in Frontiers of Characterization and Metrology for Nanoelectronics: ´ (S. 324-329). (AIP Conference Proceedings; Band 1395). https://doi.org/10.1063/1.3657911

@inproceedings{a68399061d4f411a8d7184c599915573,

title = "Fourier Scatterometry for Characterization of Sub-wavelength Periodic Two Photon Polymerization Structures",

abstract = "In the present paper we extend Fourier-Scatterometry by the use of the coherent properties of white light for the characterization of sub-wavelength periodic gratings of photosensitive material structured by two-photon polymerization. Our goal is a fast and precise optical characterization of periodical gratings of sub 100 nm size. The investigated structures include gratings produced by two-photon polymerization of photosensitive material and typical semiconductor test gratings. A Fourier-Scatterometer has been set up using a white light source and also additionally a reference-branch for white-light-interference (WLI). A sensitivity comparison between Fourier-Scatterometry and WLI-Scatterometry is presented.",

keywords = "Scatterometry, two-photon polymerization, white-light-interference",

author = "K. Frenner and Paz, \{V. Ferreras\} and S. Peterh{\"a}nsel and W. Osten and A. Ovsianikov and K. Obata and B. Chichkov",

year = "2011",

month = nov,

day = "14",

doi = "10.1063/1.3657911",

language = "English",

isbn = "9780735409651",

series = "AIP Conference Proceedings",

pages = "324--329",

booktitle = "Frontiers of Characterization and Metrology for Nanoelectronics",

note = "Frontiers of Characterization and Metrology for Nanoelectronics: 2011 ; Conference date: 23-05-2011 Through 26-05-2011",

}

Frenner, K, Paz, VF, Peterhänsel, S, Osten, W, Ovsianikov, A, Obata, K & Chichkov, B 2011, Fourier Scatterometry for Characterization of Sub-wavelength Periodic Two Photon Polymerization Structures. in Frontiers of Characterization and Metrology for Nanoelectronics: ´. AIP Conference Proceedings, Bd. 1395, S. 324-329, Frontiers of Characterization and Metrology for Nanoelectronics: 2011, Grenoble, Frankreich, 23 Mai 2011. https://doi.org/10.1063/1.3657911

Fourier Scatterometry for Characterization of Sub-wavelength Periodic Two Photon Polymerization Structures. / Frenner, K.; Paz, V. Ferreras; Peterhänsel, S. et al.
Frontiers of Characterization and Metrology for Nanoelectronics: ´. 2011. S. 324-329 (AIP Conference Proceedings; Band 1395).

Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review

TY - GEN

T1 - Fourier Scatterometry for Characterization of Sub-wavelength Periodic Two Photon Polymerization Structures

AU - Frenner, K.

AU - Paz, V. Ferreras

AU - Peterhänsel, S.

AU - Osten, W.

AU - Ovsianikov, A.

AU - Obata, K.

AU - Chichkov, B.

PY - 2011/11/14

Y1 - 2011/11/14

N2 - In the present paper we extend Fourier-Scatterometry by the use of the coherent properties of white light for the characterization of sub-wavelength periodic gratings of photosensitive material structured by two-photon polymerization. Our goal is a fast and precise optical characterization of periodical gratings of sub 100 nm size. The investigated structures include gratings produced by two-photon polymerization of photosensitive material and typical semiconductor test gratings. A Fourier-Scatterometer has been set up using a white light source and also additionally a reference-branch for white-light-interference (WLI). A sensitivity comparison between Fourier-Scatterometry and WLI-Scatterometry is presented.

AB - In the present paper we extend Fourier-Scatterometry by the use of the coherent properties of white light for the characterization of sub-wavelength periodic gratings of photosensitive material structured by two-photon polymerization. Our goal is a fast and precise optical characterization of periodical gratings of sub 100 nm size. The investigated structures include gratings produced by two-photon polymerization of photosensitive material and typical semiconductor test gratings. A Fourier-Scatterometer has been set up using a white light source and also additionally a reference-branch for white-light-interference (WLI). A sensitivity comparison between Fourier-Scatterometry and WLI-Scatterometry is presented.

KW - Scatterometry

KW - two-photon polymerization

KW - white-light-interference

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M3 - Conference contribution

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SN - 9780735409651

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