@inproceedings{ed44e92f82af4f009775914119c2ddc1,
title = "Physical mechanisms of femtosecond pulse induced damage in dielectric thin-films",
abstract = "Laser induced breakdown of a high-quality mirror consisting of alternating λ/4 layers of Ta2O5 and SiO2 and a single 500 nm thin film of Ta2O5 were studied with amplified and unamplified femtosecond pulses. The experimental data can be fitted with a model taking into account multiphoton absorption, impact ionization, and local intensity enhancements due to interference effects in the films. The results indicate that state of the art, high-quality thin films show a damage behavior that is similar to bulk materials. Defects and impurities play a negligible role. Incubation effects are found to reduce the damage threshold when the coatings are damaged with multiple pulses from a femtosecond oscillator. Time-resolved pump-probe reflection and transmission experiments indicate a decay of the excited electron plasma with characteristic time constants of 4 ps, 60 ps, and 700 ps.",
keywords = "Avalanche ionization, Femtosecond, Laser pulse induced dielectric breakdown, Multiphoton ionization, Plasma dynamics, Thin films",
author = "Jasapara, \{Jayesh C.\} and Nampoothiri, \{A. V. Vasudevan\} and Rudolph, \{Wolfgang G.\} and Detlev Ristau and Kai Starke",
year = "2001",
month = apr,
day = "12",
doi = "10.1117/12.425032",
language = "English",
isbn = "0-8194-4036-1",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
pages = "35--44",
booktitle = "Laser-Induced Damage in Optical Materials: 2000",
address = "United States",
}