Electron Beam Lithography and SEM Imaging

The Raith PIONEER systems are high-precision electron beam lithography (EBL) instruments with integrated scanning electron microscopy (SEM) for high-resolution nanostructuring and detailed material analysis. The Pioneer Two system in the LNQE research building is a hybrid system for electron beam lithography and scanning electron microscopy (EBL-SEM). It has a maximum acceleration voltage of 30 kV and uses as an electron emitter a thermal field emission (TFE) Schottky-source. The most important parameters are: System type: Pioneer Two from Raith, Beam current: 5pA – 20 nA, beam size: < 1,6 nm, Inlens detector, dual-detector for secondary and backscattered electrons, EDX–detector (Bruker QUANTAX 200) for elements between Z=5 and Z=95, Nanolithography resolution: 8 nm, Pattern generator speed: 6 MHz, Field stitching und overlayer accuracy: 50 nm, Stage travel range: 50 x 50 x 25 mm
Stage with 360° rotation und 0 – 90°tilt