A New Perfluoropolyether-Based Hydrophobic and Chemically Resistant Photoresist Structured by Two-Photon Polymerization

Carmela De Marco; Arune Gaidukeviciute; Roman Kiyan; Shane M. Eaton; Marinella Levi; Roberto Osellame; Boris N. Chichkov; Stefano Turri

doi:10.1021/la303799u

A New Perfluoropolyether-Based Hydrophobic and Chemically Resistant Photoresist Structured by Two-Photon Polymerization

Carmela De Marco^*
, Arune Gaidukeviciute
, Roman Kiyan
, Shane M. Eaton
, Marinella Levi
, Roberto Osellame
, Boris N. Chichkov
, Stefano Turri

^*Corresponding author for this work

Research output: Contribution to journal › Article › Research › peer review

Abstract

Two-photon polymerization technology has been used to fabricate submicrometer three-dimensional (3D) structures using a new polyfunctional perfluoropolyether-based resist, which is a polymer intrinsically hydrophobic and chemically resistant. The fluorinated resist was designed and synthesized in this work and successfully employed to fabricate woodpile structures in various experimental conditions. This is the first demonstration of the capability to fabricate hydrophobic and chemically resistant 3D structures with submicrometer resolution and arbitrary geometry.

Original language	English
Pages (from-to)	426-431
Number of pages	6
Journal	LANGMUIR
Volume	29
Issue number	1
DOIs	https://doi.org/10.1021/la303799u
Publication status	Published - 3 Dec 2012
Externally published	Yes

ASJC Scopus subject areas

General Materials Science
Condensed Matter Physics
Surfaces and Interfaces
Spectroscopy
Electrochemistry

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10.1021/la303799u

Cite this

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abstract = "Two-photon polymerization technology has been used to fabricate submicrometer three-dimensional (3D) structures using a new polyfunctional perfluoropolyether-based resist, which is a polymer intrinsically hydrophobic and chemically resistant. The fluorinated resist was designed and synthesized in this work and successfully employed to fabricate woodpile structures in various experimental conditions. This is the first demonstration of the capability to fabricate hydrophobic and chemically resistant 3D structures with submicrometer resolution and arbitrary geometry.",

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AU - De Marco, Carmela

AU - Gaidukeviciute, Arune

AU - Kiyan, Roman

AU - Eaton, Shane M.

AU - Levi, Marinella

AU - Osellame, Roberto

AU - Chichkov, Boris N.

AU - Turri, Stefano

PY - 2012/12/3

Y1 - 2012/12/3

N2 - Two-photon polymerization technology has been used to fabricate submicrometer three-dimensional (3D) structures using a new polyfunctional perfluoropolyether-based resist, which is a polymer intrinsically hydrophobic and chemically resistant. The fluorinated resist was designed and synthesized in this work and successfully employed to fabricate woodpile structures in various experimental conditions. This is the first demonstration of the capability to fabricate hydrophobic and chemically resistant 3D structures with submicrometer resolution and arbitrary geometry.

AB - Two-photon polymerization technology has been used to fabricate submicrometer three-dimensional (3D) structures using a new polyfunctional perfluoropolyether-based resist, which is a polymer intrinsically hydrophobic and chemically resistant. The fluorinated resist was designed and synthesized in this work and successfully employed to fabricate woodpile structures in various experimental conditions. This is the first demonstration of the capability to fabricate hydrophobic and chemically resistant 3D structures with submicrometer resolution and arbitrary geometry.

UR - https://www.scopus.com/pages/publications/84872108155

U2 - 10.1021/la303799u

DO - 10.1021/la303799u

M3 - Article

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ER -

A New Perfluoropolyether-Based Hydrophobic and Chemically Resistant Photoresist Structured by Two-Photon Polymerization

Abstract

ASJC Scopus subject areas

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