Atom lithography with cold metastable Ne* atoms

P. Engels; W. Ertmer; K. Sengstock

Atom lithography with cold metastable Ne^* atoms

P. Engels^*
, W. Ertmer
, K. Sengstock

^*Corresponding author for this work

Institute of Quantum Optics

Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review

Abstract

Experimental results as well as numerical simulation of atom lithography with a laser cooled metastable Ne^* beam are discussed. Simulation results clearly show the feasibility for sub-10 nm structures by atom lithography.

Original language	English
Title of host publication	Quantum Electronics and Laser Science Conference (QELS 2000)
Publisher	IEEE Computer Society
Number of pages	1
ISBN (Print)	1-55752-608-7
Publication status	Published - 6 Aug 2000
Event	Quantum Electronics and Laser Science Conference (QELS 2000) - San Francisco, CA, USA Duration: 7 May 2000 → 12 May 2000

Publication series

Name	OSA trends in optics and photonics : TOPS
Volume	40
ISSN (Print)	1094-5695

Conference

Conference	Quantum Electronics and Laser Science Conference (QELS 2000)
Abbreviated title	QELS 2000
City	San Francisco, CA, USA
Period	7 May 2000 → 12 May 2000

ASJC Scopus subject areas

General Physics and Astronomy

Cite this

@inproceedings{312e66616c624c788cebd8f40c36dc74,

title = "Atom lithography with cold metastable Ne* atoms",

abstract = "Experimental results as well as numerical simulation of atom lithography with a laser cooled metastable Ne* beam are discussed. Simulation results clearly show the feasibility for sub-10 nm structures by atom lithography.",

author = "P. Engels and W. Ertmer and K. Sengstock",

year = "2000",

month = aug,

day = "6",

language = "English",

isbn = "1-55752-608-7",

series = "OSA trends in optics and photonics : TOPS",

publisher = "IEEE Computer Society",

booktitle = "Quantum Electronics and Laser Science Conference (QELS 2000)",

address = "United States",

note = "Quantum Electronics and Laser Science Conference (QELS 2000), QELS 2000 ; Conference date: 07-05-2000 Through 12-05-2000",

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TY - GEN

T1 - Atom lithography with cold metastable Ne* atoms

AU - Engels, P.

AU - Ertmer, W.

AU - Sengstock, K.

PY - 2000/8/6

Y1 - 2000/8/6

N2 - Experimental results as well as numerical simulation of atom lithography with a laser cooled metastable Ne* beam are discussed. Simulation results clearly show the feasibility for sub-10 nm structures by atom lithography.

AB - Experimental results as well as numerical simulation of atom lithography with a laser cooled metastable Ne* beam are discussed. Simulation results clearly show the feasibility for sub-10 nm structures by atom lithography.

UR - https://www.scopus.com/pages/publications/0034544228

M3 - Conference contribution

SN - 1-55752-608-7

T3 - OSA trends in optics and photonics : TOPS

BT - Quantum Electronics and Laser Science Conference (QELS 2000)

PB - IEEE Computer Society

T2 - Quantum Electronics and Laser Science Conference (QELS 2000)

Y2 - 7 May 2000 through 12 May 2000

ER -