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Carbon doping of SiGe heterobipolar transistors

  • H. J. Osten
  • , D. Knoll
  • , B. Heinemann
  • , B. Tillack

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Abstract

We demonstrate cutoff and maximum oscillation frequencies of more than 70 GHz, and delays per stage down to 15 ps for ring oscillators with integrated SiGe:C heterobipolar transistors (HBT). We also demonstrate almost ideal base current characteristics for these, even with carbon in the depleted regions. The incorporation of low carbon concentration (<1020 cm-3) within the SiGe region of SiGe HBTs can significantly suppress boron outdiffusion caused by a variety of subsequent processing steps. For example, transient enhanced boron diffusion due to BF2 implantation of the external base regions can be eliminated. Thus, the use of epitaxial SiGe:C instead of SiGe layers provides greater flexibility in process design, and wider latitude in process margin.

Original languageEnglish
Title of host publication1998 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems, SiRF 1998
EditorsSammy Kayali
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages19-23
Number of pages5
ISBN (Electronic)0780352882, 9780780352889
DOIs
Publication statusPublished - 6 Aug 2022
Externally publishedYes
Event1st Topical Meeting on Silicon Mono1ithic Integrated Circuits in RF Systems, SiRF 1998 - Ann Arbor, United States
Duration: 18 Sept 199818 Sept 1998

Publication series

Name1998 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems, SiRF 1998
Volume1998-September

Conference

Conference1st Topical Meeting on Silicon Mono1ithic Integrated Circuits in RF Systems, SiRF 1998
Country/TerritoryUnited States
CityAnn Arbor
Period18 Sept 199818 Sept 1998

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Instrumentation

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