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Fourier Scatterometry for Characterization of Sub-wavelength Periodic Two Photon Polymerization Structures

  • K. Frenner*
  • , V. Ferreras Paz
  • , S. Peterhänsel
  • , W. Osten
  • , A. Ovsianikov
  • , K. Obata
  • , B. Chichkov
  • *Corresponding author for this work

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Abstract

In the present paper we extend Fourier-Scatterometry by the use of the coherent properties of white light for the characterization of sub-wavelength periodic gratings of photosensitive material structured by two-photon polymerization. Our goal is a fast and precise optical characterization of periodical gratings of sub 100 nm size. The investigated structures include gratings produced by two-photon polymerization of photosensitive material and typical semiconductor test gratings. A Fourier-Scatterometer has been set up using a white light source and also additionally a reference-branch for white-light-interference (WLI). A sensitivity comparison between Fourier-Scatterometry and WLI-Scatterometry is presented.

Original languageEnglish
Title of host publicationFrontiers of Characterization and Metrology for Nanoelectronics
Subtitle of host publication´
Pages324-329
Number of pages6
DOIs
Publication statusPublished - 14 Nov 2011
Externally publishedYes
EventFrontiers of Characterization and Metrology for Nanoelectronics: 2011 - Grenoble, France
Duration: 23 May 201126 May 2011

Publication series

NameAIP Conference Proceedings
Volume1395
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Conference

ConferenceFrontiers of Characterization and Metrology for Nanoelectronics: 2011
Country/TerritoryFrance
CityGrenoble
Period23 May 201126 May 2011

Keywords

  • Scatterometry
  • two-photon polymerization
  • white-light-interference

ASJC Scopus subject areas

  • General Physics and Astronomy

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