High frequency conductance of a quantum point contact

J. Regul; F. Hohls; D. Reuter; A. D. Wieck; R. J. Haug

doi:10.1016/j.physe.2003.11.266

High frequency conductance of a quantum point contact

J. Regul
, F. Hohls^*
, D. Reuter
, A. D. Wieck
, R. J. Haug

^*Corresponding author for this work

Institute of Solid State Physics

Ruhr-University Bochum

Research output: Contribution to journal › Conference article › Research › peer review

Abstract

We present an experimental study of the AC conductance G_AC of an atomic force microscope engraved quantum point contact at high frequency f=160 MHz. In agreement with theoretical predictions the real part R(G_AC) is unchanged from the DC-conductance G_DC. The imaginary part I(G _AC) changes for every addition of a new conductance channel.

Original language	English
Pages (from-to)	272-275
Number of pages	4
Journal	Physica E: Low-Dimensional Systems and Nanostructures
Volume	22
Issue number	1-3
DOIs	https://doi.org/10.1016/j.physe.2003.11.266
Publication status	Published - 7 Feb 2004
Event	15th International Conference on ELectronic Propreties - Nara, Japan Duration: 14 Jul 2003 → 18 Jul 2003

Keywords

AFM lithography
High frequency conductance
Quantum point contact

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics

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10.1016/j.physe.2003.11.266

Cite this

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title = "High frequency conductance of a quantum point contact",

abstract = "We present an experimental study of the AC conductance GAC of an atomic force microscope engraved quantum point contact at high frequency f=160 MHz. In agreement with theoretical predictions the real part R(GAC) is unchanged from the DC-conductance GDC. The imaginary part I(G AC) changes for every addition of a new conductance channel.",

keywords = "AFM lithography, High frequency conductance, Quantum point contact",

author = "J. Regul and F. Hohls and D. Reuter and Wieck, \{A. D.\} and Haug, \{R. J.\}",

note = "Funding information: We thank Ulrich Keyser for the AFM lithography and the AFM picture and we acknowledge financial support by the BMBF and the DFG.; 15th International Conference on ELectronic Propreties ; Conference date: 14-07-2003 Through 18-07-2003",

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doi = "10.1016/j.physe.2003.11.266",

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TY - JOUR

T1 - High frequency conductance of a quantum point contact

AU - Regul, J.

AU - Hohls, F.

AU - Reuter, D.

AU - Wieck, A. D.

AU - Haug, R. J.

N1 - Funding information: We thank Ulrich Keyser for the AFM lithography and the AFM picture and we acknowledge financial support by the BMBF and the DFG.

PY - 2004/2/7

Y1 - 2004/2/7

N2 - We present an experimental study of the AC conductance GAC of an atomic force microscope engraved quantum point contact at high frequency f=160 MHz. In agreement with theoretical predictions the real part R(GAC) is unchanged from the DC-conductance GDC. The imaginary part I(G AC) changes for every addition of a new conductance channel.

AB - We present an experimental study of the AC conductance GAC of an atomic force microscope engraved quantum point contact at high frequency f=160 MHz. In agreement with theoretical predictions the real part R(GAC) is unchanged from the DC-conductance GDC. The imaginary part I(G AC) changes for every addition of a new conductance channel.

KW - AFM lithography

KW - High frequency conductance

KW - Quantum point contact

UR - https://www.scopus.com/pages/publications/1842785392

U2 - 10.1016/j.physe.2003.11.266

DO - 10.1016/j.physe.2003.11.266

M3 - Conference article

AN - SCOPUS:1842785392

SN - 1386-9477

VL - 22

SP - 272

EP - 275

JO - Physica E: Low-Dimensional Systems and Nanostructures

JF - Physica E: Low-Dimensional Systems and Nanostructures

IS - 1-3

T2 - 15th International Conference on ELectronic Propreties

Y2 - 14 July 2003 through 18 July 2003

ER -

High frequency conductance of a quantum point contact

Abstract

Keywords

ASJC Scopus subject areas

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