Integration of UV-nanoimprint lithography with two-photon polymerization for scalable production

Lei Zheng; Axel Günther; Reinhard Caspary; Wolfgang Kowalsky; Bernhard Roth

doi:10.1117/12.2648030

Integration of UV-nanoimprint lithography with two-photon polymerization for scalable production

Lei Zheng^*, Axel Günther, Reinhard Caspary, Wolfgang Kowalsky, Bernhard Roth

^*Corresponding author for this work

Technische Universität Braunschweig

Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review

Abstract

In this work, we demonstrate a fabrication strategy for micro- and nanooptical structures by integrating UV-nanoimprint lithography (NIL) towards two-photon polymerization (2PP) for cost-effective scalable production. Herein, 2PP was first employed to create the structures. These were then used as master molds for the subsequent UV-NIL process for high-throughput replication. With this fabrication strategy, various structures with dimensions from sub-micrometer to centimeter scales were produced and replicated. High-quality UV imprinting of the 2PP-produced master sample can be realized. The demonstrated fabrication strategy exhibits great potential for applications in scalable production of optical and optoelectronic devices or systems.

Original language	English
Title of host publication	Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI
Editors	Georg von Freymann, Eva Blasco, Debashis Chanda
Publisher	SPIE
ISBN (Electronic)	9781510659711
DOIs	https://doi.org/10.1117/12.2648030
Publication status	Published - 15 Mar 2023
Event	Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI 2023 - San Francisco, United States Duration: 28 Jan 2023 → 3 Feb 2023

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	12433
ISSN (Print)	0277-786X
ISSN (Electronic)	1996-756X

Conference

Conference	Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI 2023
Country/Territory	United States
City	San Francisco
Period	28 Jan 2023 → 3 Feb 2023

Keywords

high-resolution structuring
scalable production
two-photon polymerization
UV-nanoimprint lithography

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Access to Document

10.1117/12.2648030

Cite this

Zheng, L., Günther, A., Caspary, R., Kowalsky, W., & Roth, B. (2023). Integration of UV-nanoimprint lithography with two-photon polymerization for scalable production. In G. von Freymann, E. Blasco, & D. Chanda (Eds.), Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI Article 124330G (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 12433). SPIE. https://doi.org/10.1117/12.2648030

Zheng, Lei ; Günther, Axel ; Caspary, Reinhard et al. / Integration of UV-nanoimprint lithography with two-photon polymerization for scalable production. Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI. editor / Georg von Freymann ; Eva Blasco ; Debashis Chanda. SPIE, 2023. (Proceedings of SPIE - The International Society for Optical Engineering).

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title = "Integration of UV-nanoimprint lithography with two-photon polymerization for scalable production",

abstract = "In this work, we demonstrate a fabrication strategy for micro- and nanooptical structures by integrating UV-nanoimprint lithography (NIL) towards two-photon polymerization (2PP) for cost-effective scalable production. Herein, 2PP was first employed to create the structures. These were then used as master molds for the subsequent UV-NIL process for high-throughput replication. With this fabrication strategy, various structures with dimensions from sub-micrometer to centimeter scales were produced and replicated. High-quality UV imprinting of the 2PP-produced master sample can be realized. The demonstrated fabrication strategy exhibits great potential for applications in scalable production of optical and optoelectronic devices or systems.",

keywords = "high-resolution structuring, scalable production, two-photon polymerization, UV-nanoimprint lithography",

author = "Lei Zheng and Axel G{\"u}nther and Reinhard Caspary and Wolfgang Kowalsky and Bernhard Roth",

note = "Funding Information: The authors acknowledge the financial support from the German Research Foundation (DFG) under Germany{\textquoteright}s Excellence Strategy within the Cluster of Excellence PhoenixD (EXC 2122, Project ID 390833453).; Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI 2023 ; Conference date: 28-01-2023 Through 03-02-2023",

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month = mar,

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doi = "10.1117/12.2648030",

language = "English",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

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Zheng, L, Günther, A, Caspary, R, Kowalsky, W & Roth, B 2023, Integration of UV-nanoimprint lithography with two-photon polymerization for scalable production. in G von Freymann, E Blasco & D Chanda (eds), Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI., 124330G, Proceedings of SPIE - The International Society for Optical Engineering, vol. 12433, SPIE, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI 2023, San Francisco, United States, 28 Jan 2023. https://doi.org/10.1117/12.2648030

Integration of UV-nanoimprint lithography with two-photon polymerization for scalable production. / Zheng, Lei; Günther, Axel; Caspary, Reinhard et al.
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI. ed. / Georg von Freymann; Eva Blasco; Debashis Chanda. SPIE, 2023. 124330G (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 12433).

Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review

TY - GEN

T1 - Integration of UV-nanoimprint lithography with two-photon polymerization for scalable production

AU - Zheng, Lei

AU - Günther, Axel

AU - Caspary, Reinhard

AU - Kowalsky, Wolfgang

AU - Roth, Bernhard

N1 - Funding Information: The authors acknowledge the financial support from the German Research Foundation (DFG) under Germany’s Excellence Strategy within the Cluster of Excellence PhoenixD (EXC 2122, Project ID 390833453).

PY - 2023/3/15

Y1 - 2023/3/15

N2 - In this work, we demonstrate a fabrication strategy for micro- and nanooptical structures by integrating UV-nanoimprint lithography (NIL) towards two-photon polymerization (2PP) for cost-effective scalable production. Herein, 2PP was first employed to create the structures. These were then used as master molds for the subsequent UV-NIL process for high-throughput replication. With this fabrication strategy, various structures with dimensions from sub-micrometer to centimeter scales were produced and replicated. High-quality UV imprinting of the 2PP-produced master sample can be realized. The demonstrated fabrication strategy exhibits great potential for applications in scalable production of optical and optoelectronic devices or systems.

AB - In this work, we demonstrate a fabrication strategy for micro- and nanooptical structures by integrating UV-nanoimprint lithography (NIL) towards two-photon polymerization (2PP) for cost-effective scalable production. Herein, 2PP was first employed to create the structures. These were then used as master molds for the subsequent UV-NIL process for high-throughput replication. With this fabrication strategy, various structures with dimensions from sub-micrometer to centimeter scales were produced and replicated. High-quality UV imprinting of the 2PP-produced master sample can be realized. The demonstrated fabrication strategy exhibits great potential for applications in scalable production of optical and optoelectronic devices or systems.

KW - high-resolution structuring

KW - scalable production

KW - two-photon polymerization

KW - UV-nanoimprint lithography

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T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI

A2 - von Freymann, Georg

A2 - Blasco, Eva

A2 - Chanda, Debashis

PB - SPIE

T2 - Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI 2023

Y2 - 28 January 2023 through 3 February 2023

ER -

Zheng L, Günther A, Caspary R, Kowalsky W, Roth B. Integration of UV-nanoimprint lithography with two-photon polymerization for scalable production. In von Freymann G, Blasco E, Chanda D, editors, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI. SPIE. 2023. 124330G. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.2648030

Integration of UV-nanoimprint lithography with two-photon polymerization for scalable production

Abstract

Publication series

Conference

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

PhoenixD: Cluster of Excellence 2122/1: Photonics, Optics, and Engineering – Innovation Across Disciplines

Cite this

Integration of UV-nanoimprint lithography with two-photon polymerization for scalable production

Abstract

Publication series

Conference

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Projects

PhoenixD: Cluster of Excellence 2122/1: Photonics, Optics, and Engineering – Innovation Across Disciplines

Cite this