Abstract
We produce uniform macroporous double-layers on 6 inch n-type silicon substrates by electrochemical etching under rear side illumination in a hydrofluoric acid (HF)-based electrolyte. The etched area is circular with a diameter of 13 cm. We demonstrate the detachment of 20 μm thick free-standing macroporous silicon layers with an area of 8 × 8 cm2.
| Original language | English |
|---|---|
| Title of host publication | 35th IEEE Photovoltaic Specialists Conference Honolulu, HI, June 20-25, 2010 |
| Subtitle of host publication | Conference Proceedings |
| Publisher | IEEE |
| Pages | 3122-3124 |
| Number of pages | 3 |
| ISBN (Print) | 9781424458912 |
| DOIs | |
| Publication status | Published - 2010 |
| Event | 35th IEEE Photovoltaic Specialists Conference, PVSC 2010: PVSC 2010 - Honolulu, HI, United States Duration: 20 Jun 2010 → 25 Jun 2010 Conference number: 35 |
Publication series
| Name | Conference Record of the IEEE Photovoltaic Specialists Conference |
|---|---|
| ISSN (Print) | 0160-8371 |
Conference
| Conference | 35th IEEE Photovoltaic Specialists Conference, PVSC 2010 |
|---|---|
| Abbreviated title | PVSC 2010 |
| Country/Territory | United States |
| City | Honolulu, HI |
| Period | 20 Jun 2010 → 25 Jun 2010 |
ASJC Scopus subject areas
- Control and Systems Engineering
- Industrial and Manufacturing Engineering
- Electrical and Electronic Engineering
Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver