Properties of fluoride DUV-excimer laser optics: Influence of the number of dielectric layers

Winfried Arens; Detlev Ristau; Jens Ullmann; Christoph Zaczek; Roland Thielsch; Norbert Kaiser; Angela Duparre; Oliver Apel; Klaus Mann; Hans Lauth; Helmut Bernitzki; Stefan Schippel; H. Heyer; Johanes Ebert

doi:10.1117/12.379314

Properties of fluoride DUV-excimer laser optics: Influence of the number of dielectric layers

Winfried Arens^*
, Detlev Ristau
, Jens Ullmann
, Christoph Zaczek
, Roland Thielsch
, Norbert Kaiser
, Angela Duparre
, Oliver Apel
, Klaus Mann
, Hans Lauth
, Helmut Bernitzki
, Stefan Schippel
, H. Heyer
, Johanes Ebert

^*Corresponding author for this work

Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review

Abstract

The key technologies for modern production processes with enhanced spatial resolution, require high performance DUV-excimer laser optics with enhanced optical properties. Major challenges imposed onto the requested new generation of optical elements are concentrated on lowest absorption and scattering as well as stability against highest pulse number throughput. These targets are the driving force within the German Joint Research Project `OPUS II', which is dedicated to the development of high quality optical components for the DUV spectral range. As a major contribution to these investigations, sets of reflecting stacks with four different numbers of layer pairs of LaF₃/MgF₂ were produced by 6 partners of the consortium and characterized in respect to their optical performance and structural properties. The characterization includes spectrophotometric measurements from the VUV up to the mid infrared range, calorimetric absorption measurements at 193 nm, and a comparative study in total scatter behavior at 193 nm, which was performed by three laboratories within the project. Also, besides the intrinsic stress and the surface topography of the layers, the non-linear absorption behavior of selected samples have been determined. The results are presented and discussed with respect to possible applications.

Original language	English
Title of host publication	Laser-Induced Damage in Optical Materials: 1999
Subtitle of host publication	4 - 7 October 1999, Boulder, Colorado ; proceedings
Place of Publication	Bellingham
Publisher	SPIE
Pages	250-258
Number of pages	9
ISBN (Print)	0-8194-3508-2
DOIs	https://doi.org/10.1117/12.379314
Publication status	Published - 3 Mar 2000
Externally published	Yes
Event	31st Annual Boulder Damage Symposium: 'Laser-Induced Damage in Optical Materials 1999' - Boulder, CO, USA Duration: 4 Oct 1999 → 7 Oct 1999

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Publisher	SPIE
Volume	3902
ISSN (Print)	0277-786X

Conference

Conference	31st Annual Boulder Damage Symposium: 'Laser-Induced Damage in Optical Materials 1999'
City	Boulder, CO, USA
Period	4 Oct 1999 → 7 Oct 1999

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Access to Document

10.1117/12.379314

Cite this

Arens, W., Ristau, D., Ullmann, J., Zaczek, C., Thielsch, R., Kaiser, N., Duparre, A., Apel, O., Mann, K., Lauth, H., Bernitzki, H., Schippel, S., Heyer, H., & Ebert, J. (2000). Properties of fluoride DUV-excimer laser optics: Influence of the number of dielectric layers. In Laser-Induced Damage in Optical Materials: 1999: 4 - 7 October 1999, Boulder, Colorado ; proceedings (pp. 250-258). (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 3902). SPIE. https://doi.org/10.1117/12.379314

@inproceedings{469b849dd26a40abb19c6b69e318f373,

title = "Properties of fluoride DUV-excimer laser optics: Influence of the number of dielectric layers",

abstract = "The key technologies for modern production processes with enhanced spatial resolution, require high performance DUV-excimer laser optics with enhanced optical properties. Major challenges imposed onto the requested new generation of optical elements are concentrated on lowest absorption and scattering as well as stability against highest pulse number throughput. These targets are the driving force within the German Joint Research Project `OPUS II', which is dedicated to the development of high quality optical components for the DUV spectral range. As a major contribution to these investigations, sets of reflecting stacks with four different numbers of layer pairs of LaF3/MgF2 were produced by 6 partners of the consortium and characterized in respect to their optical performance and structural properties. The characterization includes spectrophotometric measurements from the VUV up to the mid infrared range, calorimetric absorption measurements at 193 nm, and a comparative study in total scatter behavior at 193 nm, which was performed by three laboratories within the project. Also, besides the intrinsic stress and the surface topography of the layers, the non-linear absorption behavior of selected samples have been determined. The results are presented and discussed with respect to possible applications.",

author = "Winfried Arens and Detlev Ristau and Jens Ullmann and Christoph Zaczek and Roland Thielsch and Norbert Kaiser and Angela Duparre and Oliver Apel and Klaus Mann and Hans Lauth and Helmut Bernitzki and Stefan Schippel and H. Heyer and Johanes Ebert",

year = "2000",

month = mar,

day = "3",

doi = "10.1117/12.379314",

language = "English",

isbn = "0-8194-3508-2",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

publisher = "SPIE",

pages = "250--258",

booktitle = "Laser-Induced Damage in Optical Materials: 1999",

address = "United States",

note = "31st Annual Boulder Damage Symposium: 'Laser-Induced Damage in Optical Materials 1999' ; Conference date: 04-10-1999 Through 07-10-1999",

}

Arens, W, Ristau, D, Ullmann, J, Zaczek, C, Thielsch, R, Kaiser, N, Duparre, A, Apel, O, Mann, K, Lauth, H, Bernitzki, H, Schippel, S, Heyer, H & Ebert, J 2000, Properties of fluoride DUV-excimer laser optics: Influence of the number of dielectric layers. in Laser-Induced Damage in Optical Materials: 1999: 4 - 7 October 1999, Boulder, Colorado ; proceedings. Proceedings of SPIE - The International Society for Optical Engineering, vol. 3902, SPIE, Bellingham, pp. 250-258, 31st Annual Boulder Damage Symposium: 'Laser-Induced Damage in Optical Materials 1999', Boulder, CO, USA, 4 Oct 1999. https://doi.org/10.1117/12.379314

Properties of fluoride DUV-excimer laser optics: Influence of the number of dielectric layers. / Arens, Winfried; Ristau, Detlev; Ullmann, Jens et al.
Laser-Induced Damage in Optical Materials: 1999: 4 - 7 October 1999, Boulder, Colorado ; proceedings. Bellingham: SPIE, 2000. p. 250-258 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 3902).

Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review

TY - GEN

T1 - Properties of fluoride DUV-excimer laser optics

T2 - 31st Annual Boulder Damage Symposium: 'Laser-Induced Damage in Optical Materials 1999'

AU - Arens, Winfried

AU - Ristau, Detlev

AU - Ullmann, Jens

AU - Zaczek, Christoph

AU - Thielsch, Roland

AU - Kaiser, Norbert

AU - Duparre, Angela

AU - Apel, Oliver

AU - Mann, Klaus

AU - Lauth, Hans

AU - Bernitzki, Helmut

AU - Schippel, Stefan

AU - Heyer, H.

AU - Ebert, Johanes

PY - 2000/3/3

Y1 - 2000/3/3

N2 - The key technologies for modern production processes with enhanced spatial resolution, require high performance DUV-excimer laser optics with enhanced optical properties. Major challenges imposed onto the requested new generation of optical elements are concentrated on lowest absorption and scattering as well as stability against highest pulse number throughput. These targets are the driving force within the German Joint Research Project `OPUS II', which is dedicated to the development of high quality optical components for the DUV spectral range. As a major contribution to these investigations, sets of reflecting stacks with four different numbers of layer pairs of LaF3/MgF2 were produced by 6 partners of the consortium and characterized in respect to their optical performance and structural properties. The characterization includes spectrophotometric measurements from the VUV up to the mid infrared range, calorimetric absorption measurements at 193 nm, and a comparative study in total scatter behavior at 193 nm, which was performed by three laboratories within the project. Also, besides the intrinsic stress and the surface topography of the layers, the non-linear absorption behavior of selected samples have been determined. The results are presented and discussed with respect to possible applications.

AB - The key technologies for modern production processes with enhanced spatial resolution, require high performance DUV-excimer laser optics with enhanced optical properties. Major challenges imposed onto the requested new generation of optical elements are concentrated on lowest absorption and scattering as well as stability against highest pulse number throughput. These targets are the driving force within the German Joint Research Project `OPUS II', which is dedicated to the development of high quality optical components for the DUV spectral range. As a major contribution to these investigations, sets of reflecting stacks with four different numbers of layer pairs of LaF3/MgF2 were produced by 6 partners of the consortium and characterized in respect to their optical performance and structural properties. The characterization includes spectrophotometric measurements from the VUV up to the mid infrared range, calorimetric absorption measurements at 193 nm, and a comparative study in total scatter behavior at 193 nm, which was performed by three laboratories within the project. Also, besides the intrinsic stress and the surface topography of the layers, the non-linear absorption behavior of selected samples have been determined. The results are presented and discussed with respect to possible applications.

UR - https://www.scopus.com/pages/publications/0033872188

U2 - 10.1117/12.379314

DO - 10.1117/12.379314

M3 - Conference contribution

AN - SCOPUS:0033872188

SN - 0-8194-3508-2

T3 - Proceedings of SPIE - The International Society for Optical Engineering

SP - 250

EP - 258

BT - Laser-Induced Damage in Optical Materials: 1999

PB - SPIE

CY - Bellingham

Y2 - 4 October 1999 through 7 October 1999

ER -

Arens W, Ristau D, Ullmann J, Zaczek C, Thielsch R, Kaiser N et al. Properties of fluoride DUV-excimer laser optics: Influence of the number of dielectric layers. In Laser-Induced Damage in Optical Materials: 1999: 4 - 7 October 1999, Boulder, Colorado ; proceedings. Bellingham: SPIE. 2000. p. 250-258. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.379314

Properties of fluoride DUV-excimer laser optics: Influence of the number of dielectric layers

Abstract

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Conference

ASJC Scopus subject areas

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