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Thickness uniformity measurements and damage threshold tests of large-area GaAs/AlGaAs crystalline coatings for precision interferometry

  • P. Koch*
  • , G. D. Cole
  • , C. Deutsch
  • , D. Follman
  • , P. Heu
  • , M. Kinley-Hanlon
  • , R. Kirchhoff
  • , S. Leavey
  • , J. Lehmann
  • , P. Oppermann
  • , A. K. Rai
  • , Z. Tornasi
  • , J. Wöhler
  • , D. S. Wu
  • , T. Zederbauer
  • , H. Lück
  • *Corresponding author for this work

Research output: Contribution to journalArticleResearchpeer review

Abstract

Precision interferometry is the leading method for extremely sensitive measurements in gravitational wave astronomy. Thermal noise of dielectric coatings poses a limitation to the sensitivity of these interferometers. To decrease coating thermal noise, new crystalline GaAs/AlGaAs multilayer mirrors have been developed. To date, the surface figure and thickness uniformity of these alternative low-loss coatings has not been investigated. Surface figure errors, for example, cause small angle scattering and thereby limit the sensitivity of an interferometer. Here we measure the surface figure of highly reflective, substrate-transferred, crystalline GaAs/AlGaAs coatings with a custom scanning reflectance system. We exploit the fact that the reflectivity varies with the thickness of the coating. To increase penetration into the coating, we used a 1550 nm laser on a highly reflective coating designed for a center wavelength of 1064 nm. The RMS thickness variation of a two inch optic was measured to be 0.41 ± 0.05 nm. This result is within 10% of the thickness uniformity, of 0.37 nm RMS, achieved with ion-beam sputtered coatings for the aLIGO detector. We additionally measured a lower limit of the laser induced damage threshold of 64 MW/cm2 for GaAs/AlGaAs coatings at a wavelength of 1064 nm.

Original languageEnglish
Pages (from-to)36731-36740
Number of pages10
JournalOptics express
Volume27
Issue number25
E-pub ahead of print4 Dec 2019
DOIs
Publication statusPublished - 9 Dec 2019

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • QuantumFrontiers: Cluster of Excellence 2123/1: Light and Matter at the Quantum Frontier

    Schmidt, P. O. (Principal Investigator), Ospelkaus-Schwarzer, S. (Principal Investigator), Chichkov, B. (Principal Investigator), Danzmann, K. (Principal Investigator), Ertmer, W. (Principal Investigator), Hammerer, K. J. (Principal Investigator), Haug, R. (Principal Investigator), Heinzel, G. (Principal Investigator), Heurs, M. (Principal Investigator), Klempt, C. (Principal Investigator), Kroker, S. (Principal Investigator), Lisdat, C. (Principal Investigator), Mehlstäubler, T. (Principal Investigator), Müller, J. (Principal Investigator), Ospelkaus, C. (Principal Investigator), Rasel, E. M. (Principal Investigator), Recher, P. (Principal Investigator), Santos, L. S. (Principal Investigator), Schilling, M. (Principal Investigator), Schlickum, U. (Principal Investigator), Schumacher, H. W. (Principal Investigator), Surzhykov, A. (Principal Investigator), Waag, A. (Principal Investigator), Werner, R. (Principal Investigator) & Willke, B. (Principal Investigator)

    1 Jan 201931 Dec 2025

    Project: Research

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